Diffraction optics for X-ray imaging

Microelectronic Engineering

Volumn 32, Issue 1-4 SPEC. ISS., 1996, Pages 351-367

  Schmahl, Günther ^a   Rudolph, Dietbert ^a   Schneider, Gerd ^a   Thieme, Jürgen ^a   Schliebe, Thorsten ^a   Kaulich, Burkhard ^a   Hettwer, Manfred ^a  

^a UNIVERSITY OF GÖTTINGEN   (Germany)

Author keywords

Diffraction optics; Electron beam lithography; Pattern transfer; Reactive ion etching; UV laser lithography; X ray microscopy; Zone plates

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; IMAGING TECHNIQUES; NANOTECHNOLOGY; PHOTOLITHOGRAPHY; REACTIVE ION ETCHING; X RAY MICROSCOPES; X RAYS;

DIFFRACTION OPTICS;

DIFFRACTION GRATINGS;

EID: 0030234387     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/0167-9317(95)00177-8     Document Type: Article

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