Metal-oxygen-carbon interaction in the poly(p-phenylene vinylene)-aluminum system: A study by analytical transmission electron microscopy and X-ray photoelectron spectroscopy

Thin Solid Films

Volumn 283, Issue 1-2, 1996, Pages 135-139

  Nguyen, T P ^a   Mansot, J L ^a  

^a INSTITUT DES MATÉRIAUX JEAN ROUXEL   (France)

Author keywords

Aluminium; Electron energy loss spectrosocpy; Polymers; X ray photoelectron spectroscopy

Indexed keywords

ALUMINUM; CARBON; CHEMICAL BONDS; CHEMICAL REACTIONS; DEPOSITION; ELECTRON ENERGY LOSS SPECTROSCOPY; EVAPORATION; ORGANIC POLYMERS; OXYGEN; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON BONDING STATES; POLYPHENYLENE VINYLENE; RETICULATION OF CARBON; THERMAL EVAPORATION;

INTERFACES (MATERIALS);

EID: 0030234374     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(96)08844-X     Document Type: Article

References (28)

1. D.R. Baigent, N.C. Greenham, J. Grüner, R.N. Marks, R.H. Friend, S.C. Moratti and A.B. Holmes, Synth. Met., 67 (1994) 3.
2. J.R. Waldrop, M.J. Cohen, A.J. Heeger and A.J. MacDiarmid, Appl. Phys. Lett., 38 (1981) 53.
3. C. Li, Y. Wang, M. Wan and S. Li, Synth. Met., 39 (1990) 91.
4. H. An, R. Ishizawa, K. Sato, S. Kobayashi and R. Yosomiya, Synth. Met., 58 (1993) 335.
5. L.J. Brillson, J. Phys. Chem. Solids, 44 (1983) 703.
6. G. Ottaviani, Thin Solid Films, 140 (1986) 3.
7. T.P. Nguyen and S. Lefrant, J. Phys.: Condens. Matter, 1 (1989) 5197.
8. W. Bantikasseng, P. Dannetun, O. Iganäs and W.R. Salaneck, Thin Solid Films, 224 (1993) 232.
9. J.L. Jordan, P.N. Sanda J.F. Morar, C.A. Kovak, F.J. Himpseland R.A. Pollak, J. Vac. Sci. Technol., A4 (1986) 1046.
10. M. Chtaib, J. Ghijen, J.J. Pireaux, R. Caudano, R.L. Johnson, E. Orti and J.L. Bredas, Phys. Rev. B, 44 (1991) 10815.
11. D. Braun and A.J. Heeger, Appl. Phys. Lett., 58 (1991) 1982.
12. C. Frederiksson, R. Lazzaroni, J.L. Bredas, P. Dannetun, M. Lögdlund and W.R. Salaneck, Synth. Met., 55-57 (1993) 4632.
13. T.P. Nguyen, V.H. Tran, V. Massardier and A. Guyot, Synth. Met., 55-57 (1993) 353.
14. Y. Gao, K.T. Park and B.R. Hsieh, J. Appl. Phys., 73 (1993) 7894.
15. E. Ettedgui, H. Razafitrimo, K.T. Park, Y. Gao and B.R. Hsieh, J. Appl. Phys., 75 (1994) 7526.
16. T.P. Nguyen, K. Amgaad, M. Cailler and V.H. Tran, J. Adh. Sci. Technol., 5 (1994) 821.
17. R.A. Wessling and R.G. Zimmerman, US Patent no. 3 401 152, 1968.
18. A.R. Spurr, J. Ultrastruct. Res., (1969) 26.
19. J. Wery and J.L. Mansot, Mic. Microal. Microstruct., 4 (1993) 87.
20. T.P.G. Comelli, J. Stöhr, C.J. Robinson and W. Jark, Phys. Rev. B, 38 (1988) 7511.
21. J. Ritsko, J. Chem. Phys., 70 (1979) 12.
22. R.D. Leapman, L.A. Grunes and P.L. Fejes, Phys. Rev. B, 26 (1985) 614.
23. J. Stöhr in R. Gomer (ed.), NEXAFS Spectroscopy, Springer Verlag, New York, 1992, p. 162.
24. H. Ade, X. Zhang, S. Costello, J. Kirz and S. Williams, Science, 258 (1992) 972.
25. M. Bou, J.M. Martin, T. Le Mogne and L. Vovelle, Appl. Surf. Sci., 47 (1991) 149.
26. J.W. Bartha, P.O. Hahn, F. Legoues and P.S. Ho, J. Vac. Sci. Technol. A, 3 (1985) 1390.
27. P.S. Ho, P.O. Hahn, J.W. Bartha, G.W. Rubloff, F. Legoues and B.D. Silverman, J. Vac. Sci. Technol. A, 3 (1985) 739.
28. J.J. Pireaux, C. Grégoire, P.A. Thiry, R. Caudano and T.C. Clark, J. Chem. Phys., 88 (1988) 3353.