Comparative study of properties of a-Si:H films produced by hot-filament CVD, glow discharge CVD and their hybrid version

Thin Solid Films

Volumn 283, Issue 1-2, 1996, Pages 49-56

  Kumbhar, A A ^a   Kshirsagar, S T ^a  

^a NATIONAL CHEMICAL LABORATORY   (India)

Author keywords

Amorphous materials; Chemical vapour deposition; Raman scattering; Silicon

Indexed keywords

AMORPHOUS SILICON; BAND STRUCTURE; CHEMICAL VAPOR DEPOSITION; ELECTRONIC PROPERTIES; FILM GROWTH; GLOW DISCHARGES; HYDROGEN BONDS; HYDROGENATION; ION BOMBARDMENT; PHOTOCONDUCTIVITY; RAMAN SCATTERING;

DEGREE OF CHANGE; HOT FILAMENT; HYDROGENATED AMORPHOUS SILICON FILMS; OPTICAL BAND GAP; STRUCTURAL DISORDER;

AMORPHOUS FILMS;

EID: 0030234268     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(95)08516-5     Document Type: Article

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