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Volumn 35, Issue 9 A, 1996, Pages 4799-4806
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Novel impedance-matching method for plasma processing at very high frequency band
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Author keywords
Impedance matching; Inductorlcss; Ion energy distribution (IED); Matching efficiency; Plasma processing; rf bias voltage; Transmission line; VHP band
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Indexed keywords
RF POWER SOURCES;
ELECTRIC GENERATORS;
ELECTRIC SPACE CHARGE;
FREQUENCIES;
IMPEDANCE MATCHING (ELECTRIC);
PLASMA APPLICATIONS;
PLASMA DEVICES;
PLASMA THEORY;
PLASMAS;
PLASMA SOURCES;
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EID: 0030234008
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.35.4799 Document Type: Article |
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Times cited : (9)
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References (10)
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