Optical proximity effects. Part 3

Microlithography World

Volumn 5, Issue 4, 1996, Pages 23-25

  Mack, Chris A ^a  

^a KLA Tencor Austin   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MASKS; PHOTOLITHOGRAPHY; SEMICONDUCTOR DEVICE MANUFACTURE;

ISOLATED TO DENSE BIAS; LINEWIDTH REPRODUCTION; OPTICAL PROXIMITY CORRECTION (OPC); RESIST CONTRASTS;

PHOTORESISTS;

EID: 0030233919     PISSN: 1074407X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (3)