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Volumn 286, Issue 1-2, 1996, Pages 289-294
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Effect of halide ions on the formation and dissolution behaviour of zirconium oxide
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Author keywords
Halides; Oxides; Zirconium
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Indexed keywords
CAPACITANCE MEASUREMENT;
DISSOLUTION;
FILM GROWTH;
HALOGEN COMPOUNDS;
IONS;
FILM DISSOLUTION;
FILM FORMATION;
FORMATION VOLTAGE;
GALVANOSTATIC TECHNIQUE;
HALIDE IONS;
ZIRCONIA;
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EID: 0030233912
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(95)08503-3 Document Type: Article |
Times cited : (16)
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References (33)
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