A surface extended X-ray absorption fine structure study of tellurium adsorbed onto Si(100)

Applied Surface Science

Volumn 104-105, Issue , 1996, Pages 152-157

  Burgess, S R ^a   Cowie, B C C ^b   Wilks, S P ^a   Dunstan, P R ^a   Dunscombe, C J ^c   Williams, R H ^a  

^a SWANSEA UNIVERSITY   (United Kingdom)

^b DARESBURY LABORATORY   (United Kingdom)

^c CARDIFF UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ANNEALING; SURFACE STRUCTURE; TELLURIUM; X RAY SPECTROSCOPY;

SURFACE RECONSTRUCTION;

SEMICONDUCTING SILICON;

EID: 0030233379     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(96)00137-7     Document Type: Article

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