SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 283, Issue 1-2, 1996, Pages 8-11

Transparent contacts to β-SiC for optical electronic device applications

(3) Hwang, J D a Fang, Y K a Song, Y J a

a NATIONAL CHENG KUNG UNIVERSITY (Taiwan)

Author keywords

Chemical vapour deposition; Contacts; Optical properties; Silicon carbide

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC RESISTANCE; ELECTRIC VARIABLES MEASUREMENT; OHMIC CONTACTS; OPTICAL PROPERTIES; OPTOELECTRONIC DEVICES; SCHOTTKY BARRIER DIODES; SEMICONDUCTING FILMS; SILICON CARBIDE; TEMPERATURE; TRANSPARENCY;

RAPID THERMAL CHEMICAL VAPOR DEPOSITION; SPECIFIC CONTACT RESISTANCE; TRANSMISSION LINE METHOD; TRANSPARENT CONTACTS; TRANSPARENT INDIUM TIN OXIDE;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 0030233249 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/0040-6090(96)08785-8 Document Type: Article

Times cited : (3)

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