Single atom scale lithography for single electron devices

Physica B: Condensed Matter

Volumn 227, Issue 1-4, 1996, Pages 259-263

  Ahmed, H ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

Atom; Coulomb blockade; Lithography

Indexed keywords

ATOMS; ELECTRON DEVICES; FABRICATION; GOLD; SEMICONDUCTOR MATERIALS;

COULOMB BLOCKADE; SINGLE ELECTRON DEVICES;

ELECTRON BEAM LITHOGRAPHY;

EID: 0030233168     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/0921-4526(96)00415-2     Document Type: Article

References (6)

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4. S. Nagamachi, Y. Yamakage, H Maruno, M. Ueda, S. Sugimoto, M. Asari and J. Ishikawa, Appl. Phys. Lett. 62 (1993) 2143.
5. R. Woodham and H. Ahmed, J. Vac. Technol. B 12 (1994).
6. N.G. Woodward, E.G. Hufstedler and G.P. Lafyatis, App. Phy. Lett. 64(10) (1994) 1177.