Balanced inductive plasma sources

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 35, Issue 9 PART A, 1996, Pages

  Vinogradov, Georgy K ^a   Yoneyama, Shimao ^a  

^a MC Electronics Co Ltd   (Japan)

Author keywords

Full wave helical resonator; High density plasma; Inductive plasma source; Radical source

Indexed keywords

ASYNCHRONOUS GENERATORS; ELECTRIC CURRENTS; PLASMA DENSITY; RESONATORS;

ANTIPHASE RADIO FREQUENCY (RF) CAPACITIVE CURRENTS; HELICAL RESONATORS; INDUCTIVE PLASMA SOURCES;

PLASMA SOURCES;

EID: 0030233102     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.l1130     Document Type: Article

References (6)

1. H. U. Eckert: Proc. 2nd Annual Int. Conf. on Plasma Chem. and Technology, ed. H. Boenig (Technomic Publ., Lancaster, Pa, 1986) p. 173.
2. R. R. J. Gagne and A. Cantin: J. Appl. Phys. 43 (1972) 2639.
3. V. A. Godyak and R. B. Piejak: J. Appl. Phys. 68 (1990) 3157.
4. J. M. Cook and B. W. Benson: J. Electrochem. Soc. 130 (1980) 2459; E. P. G. T. van der Yen and H. Kalter: Electrochem. Soc. Ext. Abstr. 76-1 (1976) 332.
5. J. M. Cook and B. W. Benson: J. Electrochem. Soc. 130 (1980) 2459; E. P. G. T. van der Yen and H. Kalter: Electrochem. Soc. Ext. Abstr. 76-1 (1976) 332.
6. G. N. Tailor and T. M. Wolf: Polym. Eng. Sci. 20 (1980) 1087.