Photomechanical behaviour of monolayers of azobenzene derivatives

Thin Solid Films

Volumn 284-285, Issue , 1996, Pages 365-367

  Seki, Takahiro ^a   Ichimura, Kunihiro ^a   Fukuda, Ryo Ichi ^b   Tamaki, Takashi ^b  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b NATL INST OF MAT AND CHEM RES   (Japan)

Author keywords

Azobenzene; Monolayers; Photoirradiation; Photomechanical effects

Indexed keywords

CARBOXYLIC ACIDS; DERIVATIVES; PHOTOCHEMICAL REACTIONS; PHOTOMECHANICS; ULTRAVIOLET RADIATION;

AZOBENZENE DERIVATIVES; FLOATING MONOLAYER; POLYMERIC AZOBENZENE MONOLAYER;

MONOLAYERS;

EID: 0030232941     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(95)08343-X     Document Type: Article

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