Diamond film formation by oh radical injection from remote microwave H2/H2O plasma into parallel-plate RF methanol plasma

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 9 A, 1996, Pages 4826-4832

  Ikeda, Masanobu ^a   Mizuno, Etsuko ^b   Hori, Masaru ^a   Goto, Toshio ^a   Yamada, Koji ^b   Hiramatsu, Mineo ^b   Nawata, Masahito ^b  

^a NAGOYA UNIVERSITY   (Japan)

^b MEIJO UNIVERSITY   (Japan)

Author keywords

Diamond film; H radical; Microwave H2 H2O plasma; OH radical; RF methanol plasma

Indexed keywords

MICROWAVE PLASMA;

COMPOSITION EFFECTS; FILM PREPARATION; LASER APPLICATIONS; PLASMA APPLICATIONS; PLASMA SOURCES; SYNTHESIS (CHEMICAL); SYNTHETIC DIAMONDS;

DIAMOND FILMS;

EID: 0030232369     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.4826     Document Type: Article

References (12)

1. S. Matsumoto, Y. Sato, M. Kamo and N. Setaka: Jpn. J. Appl. Phys. 21 (1982) L183.
2. S. Matsumoto, Y. Sato, M. Tsutsumi and N. Setaka: J. Mater. Sci. 17 (1982) 3106.
3. M. Kamo, Y. Sato, S. Matsumoto and N. Setaka: J. Cryst. Growth 62 (1983) 642.
4. K. Suzuki, A. Sawabe, H. Yasuda and T. Inuzuka: Appl. Phys. Lett. 50 (1987) 728.
5. Y. Mitsuda, Y. Kojima, T. Yoshida and K. Akashi: J. Mater. Sci. 22 (1987) 1557.
6. T. Yara, M. Yuasa, J. S. Ma, J. Suzuki, S. Okada and A. Hiraki: Appl. Surf. Sci. 60/61 (1992) 308.
7. S. J. Harris: Appl. Phys. Lett. 56 (1990) 2298.
8. M. Tsuda, M. Nakajima and S. Oikawa: Jpn. J. Appl. Phys. 26 (1987) L527.
9. B. V. Spitsyn, L. L. Bouilov and B. V. Derjaguin: J. Cryst. Growth 52 (1981) 219.
10. D. J. Goodwin: J. Appl. Phys. 74 (1993) 6888.
11. M. Kadono, T. Inoue, A. Miyanaga and S. Yamazaki: Jpn. J. Appl. Phys. 32 (1993) 3231.
12. Y. Saito, K. Sato, K. Gomi and H. Miyanaga: J. Mater. Sci. 25 (1990) 1246.