Low temperature, aerosol-assisted chemical vapor deposition (AACVD) of CdS, ZnS, and Cd1-xZnxS using monomeric single-source precursors: M(SOCCH3)2TMEDA

Chemical Vapor Deposition

Volumn 2, Issue 5, 1996, Pages 171-174

  Nyman, May ^a   Hampden Smith, Mark J ^a   Duesler, Eileen N ^a  

^a UNIVERSITY OF NEW MEXICO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CADMIUM COMPOUNDS; CRYSTAL STRUCTURE; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; OPTICAL COATINGS; OPTICAL FILMS; SILICON WAFERS; STOICHIOMETRY; SYNTHESIS (CHEMICAL); THERMAL EFFECTS; THERMOGRAVIMETRIC ANALYSIS; X RAY DIFFRACTION ANALYSIS; ZINC SULFIDE;

AEROSOL ASSISTED CHEMICAL VAPOR DEPOSITION (AACVD); CADMIUM SULFIDE FILMS; MONOMERIC SINGLE SOURCE PRECURSORS; ZINC SULFIDE FILMS;

CHEMICAL VAPOR DEPOSITION;

EID: 0030232146     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/cvde.19960020503     Document Type: Article

References (36)