Process control of RF plasma assisted surface cleaning

Thin Solid Films

Volumn 283, Issue 1-2, 1996, Pages 158-164

  Steffen, H ^a   Schwarz, J ^a   Kersten, H ^a   Behnke, J F ^a   Eggs, C ^a  

^a UNIVERSITY OF GREIFSWALD   (Germany)

Author keywords

Aluminium; Ellipsometry; Glow discharge; Plasma processing and deposition

Indexed keywords

CLEANING; ELLIPSOMETRY; EMISSION SPECTROSCOPY; GLOW DISCHARGES; LIGHT EMISSION; OPTICAL PROPERTIES; PLASMA APPLICATIONS; PLATE METAL; PROCESS CONTROL; SURFACE CLEANING; SURFACE TREATMENT; THICKNESS MEASUREMENT;

IN SITU KINETIC ELLIPSOMETRY; OPTICAL EMISSION SPECTROSCOPY; OXYGEN PLASMA TREATMENT; PLASMA PROCESSING;

ALUMINUM;

EID: 0030231828     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(96)08535-5     Document Type: Article

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