Ba2NaNb5O15 thin films prepared by the pulsed laser ablation method

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 9 SUPPL. B, 1996, Pages 4956-4959

  Ando, Shizutoshi ^a   Nakamura, Yoshitaka ^a   Togami, Takashi ^a   Okamura, Soichiro ^b   Baba, Akira ^c   Masuda, Youichiro ^c   Tsukamoto, Takeyo ^a  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

^b TOKYO UNIVERSITY OF SCIENCE   (Japan)

^c HACHINOHE INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Ba2NaNb5O15; Ferroelectric; Pulsed laser ablation; Thin film; X ray diffraction

Indexed keywords

FERROELECTRIC THIN FILM; PULSED LASER ABLATION;

ABLATION; EXPERIMENTS; FERROELECTRIC MATERIALS; IMPROVEMENT; PULSED LASER APPLICATIONS; X RAY DIFFRACTION;

THIN FILMS;

EID: 0030231478     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.4956     Document Type: Article

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