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Volumn 166, Issue 1-4, 1996, Pages 628-630

Low-temperature epitaxial growth of InP by remote plasma-assisted metalorganic chemical vapour deposition

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; DECOMPOSITION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PLASMA APPLICATIONS; PLASMA HEATING; SEMICONDUCTING GALLIUM COMPOUNDS; SEMICONDUCTING INDIUM PHOSPHIDE; SEMICONDUCTING SILICON; SUBSTRATES; THERMAL EFFECTS;

EID: 0030231170     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/0022-0248(95)00479-3     Document Type: Article
Times cited : (3)

References (10)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.