Fabrication of fluorinated polyimide microgrids using magnetically controlled reactive ion etching (MC-RIE) and their applications to an ion drag integrated micropump

Journal of Micromechanics and Microengineering

Volumn 6, Issue 3, 1996, Pages 310-319

  Furuya, Akinori ^a   Shimokawa, Fusao ^a   Matsuura, Tohru ^a   Sawada, Renshi ^a  

^a NTT CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRODES; MASKS; METALLIZING; POLYIMIDES; REACTIVE ION ETCHING; SUBSTRATES;

ION DRAG INTEGRATED MICROPUMPS; MAGNETICALLY CONTROLLED REACTIVE ION ETCHING (MCRIE);

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0030230547     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/6/3/003     Document Type: Article

References (24)

1. Menz W, Bacher W, Harmening M and Michel A 1991 Proc. IEEE MEMS'91 Workshop (Nara, Japan, 1991) p 69
2. Ehrfeld W et al 1987 Micro-robots and Teleoperators Workshop (1987) pp 53-63
3. Bley P, Bacher W, Menz W and Mohr J 1991 Proc. IEEE Microelectron. Eng. 13 509
4. Mohr J, Burbaum C, Bley P, Menz W and Wallrabe U 1990 Micro-system Technol. '90 (Berlin, 1990) p 529
5. Engelmann G, Ehrmann O, Simon J and Reichl H 1992 Proc. IEEE MEMS'92 Workshop (Travemunde, 1992) p 93
6. Shimokawa F, Furuya A and Matsui S 1991 Proc. IEEE MEMS'91 Workshop (Nara, Japan, 1991) p 192
7. Scott P M, Babu S V and Partch R E 1990 Polymer Degrad. Stability 27 169
8. Turban G and Rapeaux M 1983 J. Electrochem. Soc. 130 2231
9. Satsu Y, Miura O, Watanabe R and Miyazaki K 1991 Trans. Inst. Electron. Info. Commun. Eng. J74-C-II 489
10. Shimokawa F, Hanaoka Y, Makihara M and Nishida Y 1995 NTT R&D 4 683
11. Kanai T, Nagayama A, Inagaki S-I and Sasakura K 1994 J. Lightwave Technol. 12 1986
12. Stuetzer O M 1959 J. Appl. Phys. 30 984
13. Yeh J T C, Grebe K R and Palmer M J 1984 J. Vac. Sci. Technol. A 2 1292
14. Furuya A and Hirono S 1990 J. Appl. Phys. 68 304
15. Matsuura T, Hasuda Y, Nishi S and Yamada N 1991 Macromolecules 24 5001
16. Sasaki S, Matsuura T, Ando S and Nishi S 1991 NTT R&D 40 967 (in Japanese)
17. Shimokawa F, Tanaka H, Uenishi Y and Sawada R 1989 J. Appl. Phys. 66 2613
18. Furuya A, Shimokawa F, Matsuura T and Sawada R 1992 Proc. 1st Int. Conf. on Intelligent Materials (ICIM'92) (Oiso, Japan, 1992) p 57
19. Furuya A, Shimokawa F, Matsuura T and Sawada R 1994 J. Micromech. Microeng. 4 67
20. Ono T, Ozawa A and Yoshihara H 1982 J. Vac. Soc. Jpn. 25 605 (in Japanese)
21. Vanderlinde W and Ruoff A L 1988 J. Vac. Sci. Technol. B 6 1621
22. Tweed B, Burba M, Tabasky M, Henck S, Wilson R and Degenkolb E 1988 J. Electrochem. Soc. 135 2896
23. Davenas J and Boiteux G 1990 Synth. Met. 35 195
24. Davenas J 1990 Mol. Cryst. Liq. Cryst. 196 231