Transparent, conductive CuI films prepared by rf-dc coupled magnetron sputtering

Thin Solid Films

Volumn 281-282, Issue 1-2, 1996, Pages 179-181

  Tanaka, Takeshi ^a   Kawabata, Keishi ^a   Hirose, Masataka ^b  

^a HIROSHIMA INSTITUTE OF TECHNOLOGY   (Japan)

^b HIROSHIMA UNIVERSITY   (Japan)

Author keywords

Copper; Sputtering; X ray photoelectron spectroscopy

Indexed keywords

CONDUCTIVE FILMS; COPPER COMPOUNDS; DEPOSITION; ELECTRIC PROPERTIES; MAGNETRON SPUTTERING; OPACITY; OPTICAL PROPERTIES; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

COPPER IODIDE; DEPOSITION RATE; IODINATION REACTION TECHNIQUE; VACUUM EVAPORATION;

FILM PREPARATION;

EID: 0030219517     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(96)08607-5     Document Type: Article

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