Oxidation of Zn films by irradiation with an excited metastable He beam

Thin Solid Films

Volumn 281-282, Issue 1-2, 1996, Pages 460-462

  Koyanagi, Tsuyoshi ^a   Fujii, Takamichi ^a,b   Oi, Ryutaro ^a   Hironaga, Nobuo ^a   Matsubara, Kakuei ^a,c  

^a YAMAGUCHI UNIVERSITY   (Japan)

^b Kyoto Research Park 17 ^*  (Japan)

^c TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

Atomic and molecular beam studies; Noble gases; Oxidation; Zinc oxide

Indexed keywords

ATOMIC BEAMS; ATOMS; ELECTRON ENERGY LEVELS; HELIUM; INERT GASES; IONIZATION; IRRADIATION; MOLECULAR BEAMS; MOLECULES; THIN FILMS; ZINC; ZINC OXIDE;

MOLECULAR ION; NOBLE GAS; PENNING IONIZATION; ZINC FILMS;

OXIDATION;

EID: 0030218616     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(96)08675-0     Document Type: Article

References (9)

1. T. Fujii, K. Morofuji, T. Koyanagi, T. Kashima and K. Matsubara, J. Vac. Soc. Jpn., 36 (1993) 344, in Japanese.
2. T. Fujii, T. Koyanagi, K. Morofuji and K. Matsubara, J. Magn. Soc. Jpn., 17 (1993) 351, in Japanese.
3. T. Fujii, T. Koyanagi, K. Morofuji, T. Kashima and K. Matsubara, Jpn. J. Appl. Phys., 55 (1994) 4482.
4. T. Kashima, A. Kinugasa, T. Yoshimura, T. Koyanagi, K. Matsubara and N. Matsuo, J. Vac. Soc. Jpn., 38 (1995) 248, in Japanese.
5. T. Fujii, T. Koyanagi and K. Matsubara, Proc. 3rd Int. Symp. Sputtering and Plasma System, Tokyo, 1995, p. 155.
6. H. Conrad, G. Ertl, J. Kuppers, S.W. Wang, K. Gerard and H. Haberland, Phys. Rev., 42 (1979) 1082.
7. F. Bozso, J.T. Yates, Jr., J. Arias, H. Metiu and R.M. Martin, J. Chem. Phys., 78 (1983) 4256.
8. Y. Harada and H. Ozaki, Jpn. J. Appl. Phys., 26 (1987) 1201.
9. A. Arai, E. Hirano, T. Urano, T. Kanaji and F. Fujimoto, J. Vac. Soc. Jpn., 28 (1985) 276, in Japanese.