Plasma polymerized acetylene thin film by pulsed discharge

Thin Solid Films

Volumn 281-282, Issue 1-2, 1996, Pages 536-538

  Uchida, T ^a   Senda, K ^a   Vinogradov, G K ^a   Morita, S ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

Acetylene; Growth mechanism; Optical spectroscopy; Plasma processing and deposition

Indexed keywords

ARGON; COMPOSITION; DEPOSITION; ELLIPSOMETRY; EMISSION SPECTROSCOPY; FILM GROWTH; PLASMA APPLICATIONS; POLYMERIZATION; SILICON WAFERS; THICKNESS MEASUREMENT; THIN FILMS; ULTRATHIN FILMS;

ELLIPSOMETER; GAS DISCHARGE; OPTICAL SPECTROSCOPY; PLASMA POLYMERIZATION; PULSED RF DISCHARGE; X RAY PHOTOEMISSION SPECTROSCOPY;

ACETYLENE;

EID: 0030218508     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(96)08725-1     Document Type: Article

References (4)

1. K. Senda, G.K. Vinogradov, S. Gorwadkar and S. Morita, J. Appl. Phys., 74 (1993) 6425.
2. N. Inagaki and H. Yasuda, J. Appl. Polym. Sci., 26 (1981) 3557.
3. G.K. Vinogradov, Yu.A. Ivanov and L.S. Polak, High Energy Chem., 15 (1981) 120.
4. Yu.A. Ivanov, Khimuya Visokikh. Energ., 23 (1989) 81 (Russian).