Comparison between Bi-superconductor thin films fabricated via co-deposition and layer-by-layer deposition by ion beam sputtering method

Thin Solid Films

Volumn 281-282, Issue 1-2, 1996, Pages 517-520

  Mori, Z ^a   Ota, H ^a   Migita, S ^a   Sakai, K ^a   Aoki, R ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

Bi superconducting thin film; Co deposition; Ion beam sputter; Layer by layer deposition

Indexed keywords

ADSORPTION; BISMUTH COMPOUNDS; CRYSTAL STRUCTURE; FABRICATION; FILM GROWTH; ION BEAMS; OXIDE SUPERCONDUCTORS; SPUTTER DEPOSITION; SUPERCONDUCTIVITY; THIN FILMS; X RAY CRYSTALLOGRAPHY;

CO DEPOSITION; ION BEAM SPUTTERING; LAYER BY LAYER DEPOSITION; PHOTOEMISSION SPECTROSCOPY; ULTRA LOW GROWTH RATE;

SUPERCONDUCTING FILMS;

EID: 0030218324     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(96)08730-5     Document Type: Article

References (7)

1. Y. Tazoh and S. Miyazawa, Appl. Phys. Lett., 62 (1993) 408.
2. K. Sakai, S. Migita, H. Ota, H. Otera and R, Aoki, IEICE Trans. Electron., E76-C (1993) 1246.
3. S. Migita, H. Ota, Z. Mori, K. Sakai and R. Aoki, in K. Yamafuji and T. Morishita (eds.), Advances in Superconductivity VII, Springer-Verlag, Tokyo, 1995, p. 897.
4. Y. Kasai and S. Sakai, J. Crystal Growth, 115 (1991) 758.
5. S. Migita, K. Sakai, H. Ota, Z. Mori and R. Aoki, Proc. 13th International Vacuum Congress/9th International Conference on Solid Surfaces, Yokohama, TF9-ThA-4.
6. S.C. Marschman and D.C. Lynch, Canadian J. Chem. Eng., (1984) 875.
7. K. Nakamura and T. Hatano, J. Appl. Phys., 77 (1995) 6462.