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Volumn 116, Issue 1-4, 1996, Pages 369-372
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Excimer laser induced thermal evaporation and ablation of silicon carbide
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Author keywords
[No Author keywords available]
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Indexed keywords
DEPOSITION;
EVAPORATION;
EXCIMER LASERS;
HEATING;
LASER ABLATION;
MATHEMATICAL MODELS;
MELTING;
MORPHOLOGY;
PULSED LASER APPLICATIONS;
TEMPERATURE MEASUREMENT;
THICKNESS MEASUREMENT;
ABLATION RATES;
ABLATION THRESHOLD;
LASER FLUENCE;
LASER PULSE ENERGY;
THERMAL MODEL;
THERMAL SPUTTERING;
SILICON CARBIDE;
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EID: 0030218249
PISSN: 0168583X
EISSN: None
Source Type: Journal
DOI: 10.1016/0168-583X(96)00072-9 Document Type: Article |
Times cited : (7)
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References (14)
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