SCOPUS 정보 검색 플랫폼

Volumn 281-282, Issue 1-2, 1996, Pages 275-278

Formation of paramagnetic defects in CVD diamond films (ESR study)

(10) Show, Y a Nakamura, Y a Izumi, T a Deguchi, M b Kitabatake, M b Hirao, T c Mori, Y d Hatta, A d Ito, T d Hiraki, A d

a TOKAI UNIVERSITY (Japan)

b PANASONIC CORPORATION (Japan)

c Matsushita Technoresearch Inc (Japan)

d OSAKA UNIVERSITY (Japan)

Author keywords

Chemical vapour deposition; Diamond; Electrical properties and measurements; Electron spin resonance

Indexed keywords

CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; CONDUCTIVE MATERIALS; CRYSTAL STRUCTURE; DIAMOND FILMS; ELECTRIC RESISTANCE; ELECTRIC RESISTANCE MEASUREMENT; HEAT TREATMENT; PARAMAGNETIC RESONANCE; SCANNING ELECTRON MICROSCOPY;

CARBON DANGLING BONDS; CONDUCTIVE SURFACE LAYERS; PARAMAGNETIC DEFECTS; SPIN DENSITY; VAN DER PAUW METHODS;

CRYSTAL DEFECTS;

EID: 0030217782 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/0040-6090(96)08651-8 Document Type: Article

Times cited : (16)

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