Structural study of epitaxial growth on silicon surfaces

Thin Solid Films

Volumn 281-282, Issue 1-2, 1996, Pages 1-4

  Ichimiya, Ayahiko ^a   Nakahara, Hitoshi ^a   Tanaka, Yoriko ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

Epitaxy; High energy electron diffraction (RHEED); Scanning tunnelling microscopy; Silicon

Indexed keywords

PYROLYSIS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTOR GROWTH; SILICON; SILICON WAFERS; STACKING FAULTS; SURFACE STRUCTURE; SURFACES;

DIMER ADATOM STACKING FAULT; METASTABLE PHASE; PERIODICITY; STEP EDGES;

EPITAXIAL GROWTH;

EID: 0030217734     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(96)08560-4     Document Type: Article

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