The influence of Bi-sticking coefficient in the growth of Bi(2212) thin film by ion beam sputtering

Thin Solid Films

Volumn 281-282, Issue 1-2, 1996, Pages 510-512

  Migita, S ^a   Sakai, K ^a   Ota, H ^a   Mori, Z ^a   Aoki, R ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

Bismuth; Sputtering; Superconductivity

Indexed keywords

BISMUTH COMPOUNDS; EVAPORATION; FILM GROWTH; ION BEAMS; OXIDE SUPERCONDUCTORS; PHASE TRANSITIONS; SPUTTER DEPOSITION; SUBLIMATION; SUPERCONDUCTIVITY; THERMAL EFFECTS; THIN FILMS;

BISMUTH OXIDE; CO DEPOSITION PROCESS; ION BEAM SPUTTERING; STICKING COEFFICIENTS; TEMPERATURE DEPENDENCE;

SUPERCONDUCTING FILMS;

EID: 0030217612     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(96)08687-7     Document Type: Article

References (5)

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2. S. Migita, K. Sakai, H. Ota, Z. Mori, H, Otera, R. Aoki and T. Suenaga, in T. Fujita and Y. Shiohara (eds.), Advances in Superconductivity VI, Springer-Verlag, Tokyo, 1994, p. 897.
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