Velocity analysis of ablated particles in pulsed laser deposition of NiO film

Thin Solid Films

Volumn 281-282, Issue 1-2, 1996, Pages 441-444

  Tasaka, Y ^a,b   Kuroda, H ^a   Tanaka, M ^a   Usami, S ^a  

^a YOKOHAMA NATIONAL UNIVERSITY   (Japan)

^b NATL INST OF MAT AND CHEM RES   (Japan)

Author keywords

Laser ablation; Nickel oxide; Optical spectroscopy; Physical vapour deposition (PVD)

Indexed keywords

CHARGED PARTICLES; EMISSION SPECTROSCOPY; KINETIC THEORY; LASER BEAM EFFECTS; LIGHT EMISSION; NICKEL COMPOUNDS; PLASMAS; PULSED LASER APPLICATIONS; STREAK CAMERAS; VAPOR DEPOSITION;

LASER FLUENCE; LASER INDUCED PLASMA; LIGHT EMITTING PARTICLES; NICKEL OXIDE; OPTICAL EMISSION; OPTICAL SPECTROSCOPY; PHYSICAL VAPOUR DEPOSITION; PULSED LASER DEPOSITION;

THIN FILMS;

EID: 0030217608     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(96)08670-1     Document Type: Article

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