Electron microscopic analysis of chemical-vapour-deposited diamond surface by a novel method

Thin Solid Films

Volumn 281-282, Issue 1-2, 1996, Pages 282-284

  Jiang, Nan ^a   Hatta, Akimitsu ^a   Won, Jaihyung ^a   Mori, Yusuke ^a   Ito, Toshimichi ^a   Sasaki, Takatomo ^a   Hiraki, Akio ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

Diamond; Etching; Surface structure; Transmission electron microscopy

Indexed keywords

AMORPHOUS FILMS; CHARACTERIZATION; CHEMICAL VAPOR DEPOSITION; ELECTRON MICROSCOPY; ETCHING; MOLYBDENUM; PLASMA APPLICATIONS; POLYCRYSTALLINE MATERIALS; SPECIMEN PREPARATION; SURFACE STRUCTURE; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

DIAMOND BUMPS; POLYCRYSTALLINE THIN FILMS; THIN AMORPHOUS LAYER;

DIAMOND FILMS;

EID: 0030217583     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(96)08653-1     Document Type: Article

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