Upper yield stress of Si crystals at high temperatures

Journal of the Electrochemical Society

Volumn 143, Issue 8, 1996, Pages

  Yonenaga, I ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL GROWTH FROM MELT; CRYSTALS; DISLOCATIONS (CRYSTALS); ELECTRIC RESISTANCE; HIGH TEMPERATURE PROPERTIES; SILICON WAFERS; STRAIN HARDENING; TENSILE TESTING; THERMAL EFFECTS; YIELD STRESS;

BOLTZMANN CONSTANT; MELTING POINT; STRESS STRAIN CURVES; TEMPERATURE DEPENDENCE; WAFER PROCESSING;

SEMICONDUCTING SILICON;

EID: 0030215961     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837021     Document Type: Article

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