Fabrication of lead iron niobate films on Si substrate by pulsed laser deposition

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 35, Issue 8 PART A, 1996, Pages

  Wang, Xin Rong ^a   Fan, Shou Shan ^a   Li, Qun Qing ^a   Gu, Bing Lin ^a   Zhang, Xiao Wen ^a  

^a TSINGHUA UNIVERSITY   (China)

Author keywords

Dielectric constant; Ferroelectric property; Lead iron niobate film; Pulsed laser deposition; X ray diffraction analysis

Indexed keywords

DEPOSITION; EPITAXIAL GROWTH; FERROELECTRICITY; FILM PREPARATION; HETEROJUNCTIONS; LEAD COMPOUNDS; PERMITTIVITY; PERMITTIVITY MEASUREMENT; PEROVSKITE; PULSED LASER APPLICATIONS; SEMICONDUCTING SILICON; X RAY DIFFRACTION ANALYSIS;

DISSIPATION FACTOR; FERROELECTRIC PROPERTIES; LEAD IRON NIOBATE FILMS; OXYGEN PRESSURE; PULSED LASER DEPOSITION;

MAGNETIC FILMS;

EID: 0030215793     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.l1002     Document Type: Article

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