Development of three-dimensional microstructure processing using macroporous n-type silicon

Applied Physics A: Materials Science and Processing

Volumn 63, Issue 2, 1996, Pages 153-159

  Ottow, S ^a   Lehmann, V ^a   Foell, H ^a  

^a UNIVERSITY OF KIEL   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; ASPECT RATIO; ELECTROCHEMISTRY; ELECTROLYTES; ETCHING; HYDROFLUORIC ACID; MICROELECTRONIC PROCESSING; MICROMACHINING; MICROSTRUCTURE; THREE DIMENSIONAL;

ELECTROCHEMICAL MACROPORE FORMATION; MACROPOROUS SILICON; PORE ETCHING TECHNIQUE;

POROUS SILICON;

EID: 0030215763     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s003390050365     Document Type: Article

References (26)