In-depth and ion image analysis of minor and trace constituents in V-Cr-Ti alloy welds

Journal of Materials Research

Volumn 11, Issue 8, 1996, Pages 1923-1933

  Odom, Robert W ^a   Grossbeck, Martin L ^b  

^a CHARLES EVANS AND ASSOCIATES   (United States)

^b OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC ARC WELDING; ELECTRON BEAM WELDING; HARDNESS; ION IMPLANTATION; SECONDARY ION MASS SPECTROMETRY; TENSILE STRENGTH; TRACE ELEMENTS; VANADIUM ALLOYS;

GAS TUNGSTEN ARC WELDING; TENSILE ELONGATION;

WELDS;

EID: 0030215740     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1996.0243     Document Type: Article

References (18)

1. T. Kainuma, N. Iwao, T. Suzuki, and R. Watanabe, J. Nucl. Mater. 80, 939 (1979).
2. D. R. Diercks and B. A. Loomis, J. Nucl. Mater. 141-143, 1117 (1986).
3. A. L. Eustice and G. N. Carlson, Trans. AIME 221, 238 (1961).
4. R. C. Svenberg and R.W. Buckman, Int. Metals Rev. 5&6, 223 (1980).
5. R. Buende, S. Fabritsiev, and V. Rybin, Fusion Eng. Design 16, 59 (1991).
6. American Society for Metals Handbook, 9th ed., edited by Welding, Brazing, and Soldering (American Society for Metals, Metals Park, OH, 1983), p. 827.
7. Secondary Ion Mass Spectrometry, edited by J. C. Vickerman, A. Brown, and N. M. Reed (Clarendon Press, Oxford, 1989).
8. R. J. Blattner, in Microstructural Science, edited by D. W. Stevens et al. (Elsevier, New York, 1980), Vol. 8.
9. Scanning Electron Microscopy and X-Ray Microanalysis, edited by J. I. Goldstein, D. E. Newbury, P. Echlin, D. C. Joy, C. Fiori, and E. Lifshin (Plenum, New York, 1984).
10. B. Rasser, D. Renard, and M. Schuhmacher, in Secondary Ion Mass Spectrometry SIMS-IX, edited by A. Benninghoven, Y. Nihei, R. Shimizu, and H. W. Werner (Wiley & Sons, New York, 1994).
11. R. W. Odom and C. J. Hitzman, in Secondary Ion Mass Spectrometry SIMS-IX, edited by A. Benninghoven, Y. Nihei, R. Shimizu, and H. W. Werner (Wiley & Sons, New York, 1994).
12. R. W. Odom, Appl. Spectrosc. Rev. 29 (1), 67 (1994).
13. T. Kainuma et al., J. Nucl. Mater. 80, 339 (1979).
14. R. G. Wilson and G. R. Brewer, Ion Beams and Their Applications to Ion Implantation (Wiley & Sons, New York, 1973).
15. J. W. Mayer, L. Eriksson, and J. A. Davies, Ion Implantation in Semiconductors: Silicon and Germanium (Academic Press, New York, 1970).
16. Y. Gao, J. Appl. Phys. 64, 3760 (1988).
17. R. G. Wilson, F. A. Stevie, G. E. Lux, C. L. Kirschbaum, S. Frank, and J. Pallix, Surf. Coating Technol. 51, 358 (1992).
18. R. H. Fleming, G. P. Meeker, and R. J. Blattner, Thin Solid Films 153, 197 (1987).