Dissociative mechanisms of monosilane and arsine on copper(II) oxide

Journal of the Electrochemical Society

Volumn 143, Issue 8, 1996, Pages 2654-2657

  Watanabe, Tadaharu ^a,d   Imai, Hiroaki ^b   Suzuki, Takashi ^c  

^a TAIYO NIPPON SANSO CORPORATION   (Japan)

^b KEIO UNIVERSITY   (Japan)

^c UNIVERSITY OF YAMANASHI   (Japan)

^d ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ARSENIC COMPOUNDS; CHEMICAL ANALYSIS; CHEMICAL REACTIONS; DISSOCIATION; HYDRIDES; OXIDES; POWDERS; SILANES; SURFACE PROPERTIES; SURFACES; WATER;

ADSORPTION CAPACITIES; ARSINE; COPPER OXIDE; MONOSILANE; SPECIFIC SURFACE AREAS; VOLATILE WATER;

COPPER COMPOUNDS;

EID: 0030215554     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837064     Document Type: Article

References (5)

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