Bipolar integrated Kelvin test structure for contact resistance measurement of self-aligned implantations

IEEE Transactions on Semiconductor Manufacturing

Volumn 9, Issue 3, 1996, Pages 455-460

  Nanver, Lis K ^a,b   Goudena, Egbert J G ^b   Slabbekoorn, John ^b  

^a IEEE

^b DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

BIPOLAR TRANSISTORS; ELECTRIC CONTACTS; ELECTRIC RESISTANCE MEASUREMENT; ION IMPLANTATION; MONITORING; OPTIMIZATION;

BIPOLAR INTEGRATED KELVIN TEST STRUCTURE; CONTACT WINDOW; DIFFUSION TAPS; EMITTER ANNEAL CYCLE; SELF ALIGNED IMPLANTATIONS;

SEMICONDUCTOR DEVICE STRUCTURES;

EID: 0030214843     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/66.536116     Document Type: Article

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