The effect of nitrogen on pulsed laser deposition of amorphous silicon carbide films: Properties and structure

Journal of Materials Research

Volumn 11, Issue 8, 1996, Pages 1979-1986

  Yee, Andrew L ^a,b   Ong, H C ^a   Xiong, Fulin ^a,c   Chang, R P H ^a  

^a Northwestern University   (United States)

^b INTEL CORPORATION   (United States)

^c 3M COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; COMPOSITION EFFECTS; COMPRESSIVE STRENGTH; DEPOSITION; ELLIPSOMETRY; INFRARED SPECTROSCOPY; LASER ABLATION; NITROGEN; PRESSURE EFFECTS; PULSED LASER APPLICATIONS; SILICON CARBIDE; STRESS ANALYSIS;

OPTICAL EMISSION SPECTROSCOPY; PULSED LASER DEPOSITION;

AMORPHOUS FILMS;

EID: 0030214287     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1996.0249     Document Type: Article

References (28)

1. J. Schwan, W. Dworschak, K. Jung, and H. Ehrhardt, Diamond Relat. Mater. 3, 1034 (1994).
2. F. M. Elhossary, D. J. Fabian, and A. P. Webb, Thin Solid Films 192, 201 (1990).
3. T. Frauenheim, U. Stephan, K. Bewilogua, F. Jungnickel, P. Blaudeck, and E. Fromm, Thin Solid Films 182, 63 (1989).
4. F.X. Lu, B.X. Yang, D.G. Cheng, R.Z. Ye, W.X. Yu, and J.B. Sun, Thin Solid Films 212, 220 (1992).
5. I. S. Trakhtenberg, S.A. Plotnikov, A.B. Vladimirov, Y. L. Liberman, V. A. Kanalina, V. A. Boborykin, and V.M. Leizerov, Diamond Relat. Mater. 2, 1434 (1993).
6. H. Kurokawa, T. Yonezawa, and T. Mitani, IEEE Trans. Magnetics 23, 2410 (1987).
7. A. Y. Liu and M. L. Cohen, Phys. Rev. B 41, 10727 (1990).
8. F. Xiong and R. P. H. Chang, in Novel Forms of Carbon, edited by C. L. Renschler, J. J. Pouch, and D. M. Cox (Mater. Res. Soc. Symp. Proc. 270, Pittsburgh, PA, 1992), p. 451.
9. D. F. Franceschini, C. A. Achete, and F. L. Freire, Jr., Appl. Phys. Lett. 60, 3229 (1992).
10. F. Xiong, Y. Y. Wang, V. Leppert, and R.P.H. Chang, J. Mater. Res. 8, 2265 (1993).
11. J. O. Kim and J. D. Achenbach, Thin Solid Films 214, 25 (1992).
12. M. Ohring, The Materials Science of Thin Films (Academic Press, Boston, 1992).
13. W. A. Brantley, J. Appl. Phys. 44, 534 (1973).
14. H. G. Tompkins, A User's Guide to Ellipsometry (Academic Press, Boston, 1993).
15. Engineered Materials Handbook, Vol. 4, edited by ASM INTERNATIONAL (ASM INTERNATIONAL, Materials Park, OH, 1991).
16. Handbook of Optical Constants of Solids, edited by E. D. Paulik (Academic Press, Orlando, FL, 1985).
17. J. P. Li, A. J. Steckl, I. Golecki, F. Reidinger, L. Wang, X. J. Ning, and P. Pirouz, Appl. Phys. Lett. 62, 3135 (1993).
18. M. M. Pradham and M. Arora, Jpn. J. Appl. Phys. I 31, 176 (1992).
19. B-R. Zhang, Z. Yu, G. J. Collins, T. Hwang, and W. H. Ritchie, J. Vac. Sci. Technol. A 7, 176 (1989).
20. H-X Man and B. J. Feldman, Solid State Commun. 65, 921 (1988).
21. Handbook of Auger Electron Spectroscopy, 2nd ed., edited by L. E. Davis, N. C. MacDonald, P. W. Palmberg, G. E. Rlach, and R. E. Weber (Physical Electronics Industries, Eden Prairie, MN, 1976).
22. R. Berjoan, J. Rodriguez, and F. Sibieude, Surf. Sci. 271, 237 (1992).
23. S. S. Chao, J. E. Tyler, D. V. Tsu, G. Lucovsky, and M. J. Mantini, J. Vac. Sci. Technol. A 5, 1283 (1987).
24. R. C. Weast and M. J. Astle, CRC Handbook of Chemistry and Physics 62nd edition (CRC Press, Boca Raton, FL, 1982).
25. R. W. B. Pearse and A. G. Gaydon, The Identification of Molecular Spectra, 3rd ed. (Chapman & Hall, Ltd., London, 1963).
26. W. Marine, V. Tokarev, M. Gerri, M. Sentis, and E. Fogarassy, Thin Solid Films 241, 103 (1994).
27. P. Boher, M. Renaud, L. J. van IJzendoorn, and Y. Hily, Appl. Phys. Lett. 54, 511 (1989).
28. J. C. S. Kools, C. J. C. M. Nillesen, S. H. Brongersma, E. van de Riet, and J. Dieleman, J. Vac. Sci. Technol. A 10, 1809 (1992).