Role of surface effects in the inelastic background of X-ray photoelectron spectroscopy

Surface and Interface Analysis

Volumn 24, Issue 8, 1996, Pages 490-496

  Chen, Y F ^a   Chen, Y T ^b  

^a National Science Council   (Taiwan)

^b WUFENG INSTITUTE OF TECHNOLOGY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CALCULATIONS; ELECTRON EMISSION; ELECTRON ENERGY LEVELS; ELECTRON SCATTERING; FUNCTIONS; GOLD; PROBABILITY; STATISTICS; X RAY PHOTOELECTRON SPECTROSCOPY;

DIFFERENTIAL INVERSE MEAN FREE PATH; DIFFERENTIAL SURFACE EXCITATION PARAMETERS; LANDAU FORMULA; POISSON STATISTICS; TOUGAARD METHOD;

SURFACE STRUCTURE;

EID: 0030212892     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/(sici)1096-9918(199608)24:8<490::aid-sia145>3.0.co;2-z     Document Type: Article

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