Some new optical measurement techniques for the study of crystal growth and electrode processes

Optics and Lasers in Engineering

Volumn 25, Issue 2-3 SPEC. ISS., 1996, Pages 191-204

  Yu, Xiling ^a   Liu, Youchen ^a   Yu, Xuefeng ^a   Sun, Yi ^a   Chen, Shenhao ^a   Wang, Chao ^b  

^a SHANDONG UNIVERSITY   (China)

^b Xuzhou Teachers College   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL GROWTH; DIFFRACTOMETERS; ELECTRODES; IMAGING TECHNIQUES; INTERFACES (MATERIALS); INTERFEROMETRY; PHOTOGRAPHY;

ELECTRODE PROCESSES; HOLOGRAPHIC PHASE CONTRAST INTERFEROMETRIC MICROPHOTOGRAPHY; LASER DIFFRACTOMETRY; PHASE CONJUGATION INTERFEROMETRY;

OPTICAL SYSTEMS;

EID: 0030212056     PISSN: 01438166     EISSN: None     Source Type: Journal    
DOI: 10.1016/0143-8166(95)00065-8     Document Type: Article

References (25)

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