Tribological behavior of ultra-thin soft metallic deposits on hard substrates

Wear

Volumn 196, Issue 1-2, 1996, Pages 171-179

  Jang, Dong Seob ^a,c   Kim, Dae Eun ^b  

^a Ohio State University   (United States)

^b Yonsei University   (South Korea)

^c Samsung Electro Mechanics   (South Korea)

Author keywords

Friction; Soft metallic film; Ultra thin film; Wear

Indexed keywords

EVAPORATION; FILM PREPARATION; FRICTION; LOADS (FORCES); MATHEMATICAL MODELS; PROTECTIVE COATINGS; SILICON; SPUTTER DEPOSITION; SUBSTRATES; TRIBOLOGY; ULTRATHIN FILMS; WEAR OF MATERIALS;

HARD SUBSTRATES; LOAD DEPENDENCY; PLOWING FRICTION MODEL; SILICON SUBSTRATES; SLIDING TESTS; ULTRATHIN SOFT METALLIC DEPOSITS;

METALLIC FILMS;

EID: 0030211979     PISSN: 00431648     EISSN: None     Source Type: Journal    
DOI: 10.1016/0043-1648(95)06918-6     Document Type: Article

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