Reduction of dislocation mobility in GexSi1-xepilayers

Philosophical Magazine Letters

Volumn 74, Issue 2, 1996, Pages 67-72

  Jurkschat, Kerstin ^a   Roberts, Steve G ^a  

^a UNIVERSITY OF OXFORD   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

DISLOCATIONS (CRYSTALS); SEMICONDUCTING GERMANIUM COMPOUNDS; SEMICONDUCTING SILICON COMPOUNDS;

DISLOCATION MOBILITY REDUCTION; MISFIT STRESS; MOLE FRACTION;

SEMICONDUCTING FILMS;

EID: 0030211401     PISSN: 09500839     EISSN: 13623036     Source Type: Journal    
DOI: 10.1080/095008396180416     Document Type: Article

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