Thermal decomposition of tetraethoxysilane studied by atmospheric mass-spectrometer

Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals

Volumn 60, Issue 8, 1996, Pages 751-756

  Sirakami, Keita ^a,b   Kobayashi, Kenji ^a,c   Kikuchi, Hiroshi ^a   Fuwa, Akio ^a  

^a WASEDA UNIVERSITY   (Japan)

^b SONY CORPORATION   (Japan)

^c Sinetu Chemical Industry Corp

Author keywords

Kinetics mass spectrometer; Tetraethoxysilane; Thermal decomposition

Indexed keywords

MASS SPECTROMETRY; PRECIPITATION (CHEMICAL); PYROLYSIS; REACTION KINETICS; SILICA;

KINETICS MASS SPECTROMETER; TETRAETHOXYSILANE;

SILANES;

EID: 0030206581     PISSN: 00214876     EISSN: None     Source Type: Journal    
DOI: 10.2320/jinstmet1952.60.8_751     Document Type: Article

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