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Volumn 363, Issue 1-3, 1996, Pages 337-341
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Electron-stimulated desorption study of an atomic hydrogen-adsorbed FZ-Si(100) surface
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Author keywords
Electron stimulated desorption (ESD); Low index single crystal surfaces; Silicon
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Indexed keywords
ADSORPTION;
ANNEALING;
AUGER ELECTRON SPECTROSCOPY;
HYDROGEN;
OXYGEN;
PROTONS;
SEMICONDUCTING SILICON;
SINGLE CRYSTALS;
SURFACES;
ELECTRON STIMULATED DESORPTION;
FLOATING ZONE METHOD;
KINETIC ENERGY DISTRIBUTION;
LANGMUIR HYDROGEN;
THRESHOLD ELECTRON ENERGY;
TIME OF FLIGHT METHOD;
DESORPTION;
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EID: 0030205840
PISSN: 00396028
EISSN: None
Source Type: Journal
DOI: 10.1016/0039-6028(96)00158-6 Document Type: Article |
Times cited : (3)
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References (18)
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