Crosslinked PMMA as a high-resolution negative resist for electron beam lithography and applications for physics of low-dimensional structures

Semiconductor Science and Technology

Volumn 11, Issue 8, 1996, Pages 1235-1238

  Zailer, I ^a   Frost, J E F ^a   Chabasseur Molyneux, V ^a   Ford, C J B ^a   Pepper, M ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; POLYMETHYL METHACRYLATES; SEMICONDUCTOR DEVICE MANUFACTURE;

HIGH RESOLUTION NEGATIVE RESIST; LOW DIMENSIONAL SEMICONDUCTOR DEVICE STRUCTURE;

SEMICONDUCTING POLYMERS;

EID: 0030205441     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/11/8/021     Document Type: Article

References (9)

1. For a review see for example Wilkinson D W and Beaumont S P 1986 The Physics and Fabrication of Microstructures and Microdevices ed M J Kelly and C Weissbuch (Berlin: Springer)
2. Thornton T J, Pepper M, Ahmed H, Andrews D and Davies G J 1986 Phys. Rev. Lett. 56 1198
3. For a review see for example Beenaker C W J and van Houten H 1991 Solid State Phys. 44 1
4. Hatzakis M 1969 J. Electrochem. Soc. 116 1033
5. Ford C J B, Thornton T J, Newbury R, Pepper M, Ahmed H, Davies G J and Andrews D 1988 Superlatt. Microstruct. 4 541
6. Simpson P, Ford C J B, Mace D R, Zailer F, Yosefin M, Pepper M, Ritchie D A, Frost J E F, Grimshaw M P and Jones G A C 1993 Appl. Phys. Lett. 63 3191
7. Taylor R P, Adams J A, Davies M, Marshall P A and Barber R 1993 J. Vac. Sci. Technol. B 11 628
8. Jain J K and Kivelson S A 1988 Phys. Rev. Lett. 60 1542
9. Ford C J B, Zailer I, Simpson P J, Franklin J E F, Pepper M, Frost J E F, Ritchie D A and Jones G A C 1994 J. Phys.: Condens. Matter 6 L725