Photobleaching process in polysilane films

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 7, 1996, Pages 4096-4100

  Hayashi, Hideki ^a   Kurando, Tetsuya ^a   Oka, Kunio ^a   Dohmaru, Takaaki ^a   Nakayama, Yoshikazu ^a  

^a Osaka Prefecture University   (Japan)

Author keywords

Photobleaching; Poly(methylphenylsilane); Polysilane; Thermal assisted photoscission

Indexed keywords

FILMS; LIGHT; MODELS; PHOTOCONDUCTIVITY; PHOTOLUMINESCENCE; PHOTONS;

PHOTOBLEACHING PROCESS; POLYSILANE FILMS; THERMAL ASSISTED PHOTOSCISSION;

POLYSILANES;

EID: 0030196261     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.4096     Document Type: Article

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