Growth and characterization of HTSC thin films for microelectronic devices

Microelectronics Journal

Volumn 27, Issue 4-5, 1996, Pages 343-360

  Perrin, A ^a   Guilloux Viry, M ^a   Castel, X ^a   Le Paven Thivet, C ^a,b  

^a CNRS   (France)

^b MAX PLANCK INSTITUT FÜR FESTKÖRPERFORSCHUNG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION; ELECTRON DIFFRACTION; EPITAXIAL GROWTH; HIGH TEMPERATURE SUPERCONDUCTORS; MICROELECTRONICS; MICROSTRUCTURE; MICROWAVE MEASUREMENT; X RAY DIFFRACTION;

CHANNELING METHODS; EPITAXIAL THIN FILMS; MICROELECTRONIC DEVICES; SURFACE RESISTANCE;

SUPERCONDUCTING FILMS;

EID: 0030195650     PISSN: 00262692     EISSN: None     Source Type: Journal    
DOI: 10.1016/0026-2692(95)00061-5     Document Type: Review

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