Nanofabrication with proximal probes

Surface Science

Volumn 361-362, Issue , 1996, Pages 870-873

  Campbell, P M ^a   Snow, E S ^a   McMarr, P J ^b  

^a NAVAL RESEARCH LABORATORY   (United States)

^b SFA INC   (United States)

Author keywords

Atomic force microscopy; Etching; Field effect; Oxidation; Semiconducting surfaces; Semiconductor insulator interfaces; Silicon; Silicon oxides

Indexed keywords

ANODIC OXIDATION; ATOMIC FORCE MICROSCOPY; CHEMICAL BONDS; ELECTRIC FIELDS; ETCHING; FIELD EFFECT TRANSISTORS; INTERFACES (MATERIALS); PROBES; SEMICONDUCTING SILICON; SILICA;

NANOMETER SCALE OXIDE PATTERNS; PROXIMAL PROBES; SELECTIVE ETCHING; SEMICONDUCTOR INSULATOR INTERFACES; SIDE GATED SILICON FIELD EFFECT TRANSISTORS;

NANOTECHNOLOGY;

EID: 0030195256     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/0039-6028(96)00553-5     Document Type: Article

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