Origin of dislocation loops in α-silicon nitride

Journal of Materials Research

Volumn 11, Issue 7, 1996, Pages 1725-1732

  Wang, Chong Min ^a,b   Pan, Xiao Qing ^a   Rühle, Manfred ^a  

^a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

^b NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CERAMIC MATERIALS; CHEMICAL VAPOR DEPOSITION; CRYSTAL LATTICES; DISLOCATIONS (CRYSTALS); POWDERS; STACKING FAULTS;

DISLOCATION LOOPS; IMIDE DECOMPOSITION; SILICA CARBOTHERMAL REDUCTION; SILICON NITRIDATION; STRUCTURAL VACANCIES; THERMALLY ACTIVATED VACANCIES;

SILICON NITRIDE;

EID: 0030194327     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1996.0216     Document Type: Article

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