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Volumn 19, Issue 8, 1996, Pages 291-292
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SiOF films: the problem in logic devices
a
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
FILM GROWTH;
INSULATING MATERIALS;
LOGIC DEVICES;
LSI CIRCUITS;
PERMITTIVITY;
SANDWICH STRUCTURES;
CHEMICAL MECHANICAL PLANARIZATION COMPATIBILITY;
ENDPOINT;
GAP FILL;
HIGH DENSITY PLASMA CHEMICAL VAPOR DEPOSITION;
METAL ATTACK;
SEMICONDUCTING FILMS;
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EID: 0030194017
PISSN: 01633767
EISSN: None
Source Type: Journal
DOI: None Document Type: Article |
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Times cited : (5)
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References (0)
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