Simple multiwavelength device fabrication technique using a single-grating holographic exposure

IEEE Photonics Technology Letters

Volumn 8, Issue 7, 1996, Pages 867-869

  Delorme, F ^a   Grosmaire, S ^a   Alibert, G ^a   Slempkes, S ^a   Ougazzaden, A ^a  

^a ORANGE LABS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION GRATINGS; ELECTRIC CURRENTS; ETCHING; FREQUENCY DIVISION MULTIPLEXING; HOLOGRAPHY; OPTICAL WAVEGUIDES; REFRACTIVE INDEX; SEMICONDUCTOR DEVICE MANUFACTURE;

BRAGG WAVELENGTH SPACING; HIGH OUTPUT POWER; LOCALIZED SELECTIVE ETCHING STEPS; LOW THRESHOLD CURRENTS; MULTIWAVELENGTH DEVICE FABRICATION; SINGLE GRATING HOLOGRAPHIC EXPOSURE; TUNABILITY;

SEMICONDUCTOR LASERS;

EID: 0030193866     PISSN: 10411135     EISSN: None     Source Type: Journal    
DOI: 10.1109/68.502253     Document Type: Article

References (7)

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