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Volumn 164, Issue 1-4, 1996, Pages 180-184
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Growth study of chemical beam epitaxy of GaNxP1-x using NH3 and tertiarybutylphosphine
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Author keywords
[No Author keywords available]
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Indexed keywords
AMMONIA;
CHEMICAL BEAM EPITAXY;
CRYSTAL LATTICES;
GALLIUM;
ION IMPLANTATION;
MONITORING;
OSCILLATIONS;
REFLECTION HIGH ENERGY ELECTRON DIFFRACTION;
CRACKING EFFICIENCY;
INCORPORATION RATES;
LATTICE MATCH;
SINGLE CRACKER;
TERTIARYBUTYLPHOSPHINE;
TRIETHYLGALLIUM;
X RAY ROCKING CURVE;
GALLIUM ALLOYS;
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EID: 0030193201
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/0022-0248(95)01027-0 Document Type: Article |
Times cited : (9)
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References (16)
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