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Volumn 35, Issue 7, 1996, Pages 4133-4137

Down to 0.1 μm pattern replication in synchrotron radiation lithography

Author keywords

Exposure latitude; Lithography; Mask; Mask contrast; Resolution; SR lithography; X ray

Indexed keywords

EXPERIMENTS; EXPOSURE CONTROLS; MASKS; RADIATION EFFECTS; SYNCHROTRON RADIATION; X RAY APPARATUS;

EXPOSURE LATITUDE; MASK CONTRAST; SYNCHROTRON RADIATION LITHOGRAPHY;

X RAY LITHOGRAPHY;

EID: 0030192861 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.35.4133 Document Type: Article

Times cited : (2)

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