SCOPUS 정보 검색 플랫폼

Applied Physics A: Materials Science and Processing

Volumn 63, Issue 1, 1996, Pages 9-12

Arc plasma jet cleaning of the silicon surface before CoSi2/Si contact formation

(4) Pavlov, G Ya a Pugachevich, V P b Gromov, D G b Kudryashova, E B b

a Centre for Analysis of Substances (Russian Federation)

b NATIONAL RESEARCH UNIVERSITY OF ELECTRONIC TECHNOLOGY (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE; AUGER ELECTRON SPECTROSCOPY; COBALT; COBALT ALLOYS; DEPOSITION; ELECTRIC DISCHARGES; ETCHING; PLASMA JETS; SILICON COMPOUNDS; SPUTTERING; SURFACE CLEANING; SYNTHESIS (CHEMICAL);

ARC PLASMA JET CLEANING; ARGON ION BEAM SPUTTER ETCHING; COBALT SILICIDE SILICON CONTACT; SCHOTTKY BARRIER CONTACT; SILICON SURFACE;

SILICON;

EID: 0030192646 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/BF01579740 Document Type: Article

Times cited : (3)

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